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Etching Characteristics of YMnO3 Thin Films in Cl Based Inductively Coupled Plasma
Etching Characteristics of YMnO3 Thin Films in Cl Based Inductively Coupled Plasma / Dong ...
Etching Characteristics of YMnO3 Thin Films in Cl Based Inductively Coupled Plasma

Detailed Information

Material Type  
 기사
ISSN  
12297607
Author  
Dong Pyo Kim
Title/Author  
Etching Characteristics of YMnO3 Thin Films in Cl Based Inductively Coupled Plasma / Dong Pyo Kim ; Chang Il Kim
Publish Info  
서울 : 한국전기전자재료학회, 2004.
Material Info  
pp. 29-34
General Note  
Includes Bibliography
Added Entry-Personal Name  
Chang Il Kim
Host Item Entry  
Transactions on Electrical and Electronic Materials : Vol.4, No.2 (2003 April) 2004, 04
Electronic Location and Access  
 url
모체레코드  
모체정보확인
Control Number  
kjul:60232694

MARC

 008190927s2004        ulk                          aa    eng
■022    ▼a12297607
■1001  ▼aDong  Pyo  Kim
■24510▼aEtching  Characteristics  of  YMnO3  Thin  Films  in  Cl  Based  Inductively  Coupled  Plasma▼dDong  Pyo  Kim  ▼eChang  Il  Kim  
■260    ▼a서울▼b한국전기전자재료학회▼c2004.
■300    ▼app.  29-34
■500    ▼aIncludes  Bibliography
■7001  ▼aChang  Il  Kim
■773    ▼tTransactions  on  Electrical  and  Electronic  Materials▼gVol.4,  No.2  (2003  April)▼d2004,  04
■856    ▼uhttp://www.kieeme.or.kr
■SIS    ▼aS014501▼b60055341▼h8▼s2▼fP

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