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Reproducible Chemical Mechanical Polishing Characteristics of Shallow Trench Isolation Structure using High Selectivity Slurry
Reproducible Chemical Mechanical Polishing Characteristics of Shallow Trench Isolation Str...
Reproducible Chemical Mechanical Polishing Characteristics of Shallow Trench Isolation Structure using High Selectivity Slurry

Detailed Information

자료유형  
 기사
ISSN  
12297607
저자명  
So Young Jeong
서명/저자  
Reproducible Chemical Mechanical Polishing Characteristics of Shallow Trench Isolation Structure using High Selectivity Slurry / So Young Jeong , Yong Jin Seo , Sang Yong Kim
발행사항  
서울 : 한국전기전자재료학회, 2003.
형태사항  
pp. 5-9
주기사항  
Includes Bibliography
기타저자  
Yong Jin Seo , Sang Yong Kim
기본자료저록  
Transactions on Electrical and Electronic Materials : Vol.3, No.4 (2002 December) 2003, 12
원문정보  
 url
모체레코드  
모체정보확인
Control Number  
kjul:60232668

MARC

 008190927s2003        ulk                          aa    eng
■022    ▼a12297607
■1001  ▼aSo  Young  Jeong
■24510▼aReproducible  Chemical  Mechanical  Polishing  Characteristics  of  Shallow  Trench  Isolation  Structure  using  High  Selectivity  Slurry▼dSo  Young  Jeong  ▼eYong  Jin  Seo  ,  Sang  Yong  Kim  
■260    ▼a서울▼b한국전기전자재료학회▼c2003.
■300    ▼app.  5-9
■500    ▼aIncludes  Bibliography
■7001  ▼aYong  Jin  Seo  ,  Sang  Yong  Kim
■773    ▼tTransactions  on  Electrical  and  Electronic  Materials▼gVol.3,  No.4  (2002  December)▼d2003,  12
■856    ▼uhttp://www.kieeme.or.kr
■SIS    ▼aS014499▼b60055341▼h8▼s2▼fP

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