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Stability of H2O2 as an Oxidizer for Cu CMP
Stability of H2O2 as an Oxidizer for Cu CMP
Detailed Information
- 자료유형
- 기사
- ISSN
- 12297607
- 저자명
- Do Won Lee
- 서명/저자
- Stability of H2O2 as an Oxidizer for Cu CMP / Do Won Lee , Tae Gun Kim , Nam Hoon Kim , Sang Yong Kim , Eui Goo Chang
- 발행사항
- 서울 : 한국전기전자재료학회, 2005.
- 형태사항
- pp. 29-32
- 주기사항
- Includes Bibliography
- 원문정보
- url
- 모체레코드
- 모체정보확인
- Control Number
- kjul:60232155
MARC
008190926s2005 ulk aa eng■022 ▼a12297607
■1001 ▼aDo Won Lee
■24510▼aStability of H2O2 as an Oxidizer for Cu CMP▼dDo Won Lee ▼eTae Gun Kim , Nam Hoon Kim , Sang Yong Kim , Eui Goo Chang
■260 ▼a서울▼b한국전기전자재료학회▼c2005.
■300 ▼app. 29-32
■500 ▼aIncludes Bibliography
■7001 ▼aTae Gun Kim , Nam Hoon Kim , Sang Yong Kim , Eui Goo Chang
■773 ▼tTransactions on Electrical and Electronic Materials▼gVol.6, No.1 (2005 February)▼d2005, 02
■856 ▼uhttp://www.kieeme.or.kr
■SIS ▼aS014512▼b60055341▼h8▼s2▼fP
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