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A Study on the Optimized Copper Electrochemical Plating in Dual Damascene Process
A Study on the Optimized Copper Electrochemical Plating in Dual Damascene Process
Detailed Information
- 자료유형
- 기사
- ISSN
- 12297607
- 저자명
- Hae Young Yoo
- 서명/저자
- A Study on the Optimized Copper Electrochemical Plating in Dual Damascene Process / Hae Young Yoo , 공저 Eui Goo Chang , Nam Hoon Kim
- 발행사항
- 서울 : 한국전기전자재료학회, 2005.
- 형태사항
- pp. 225-228
- 주기사항
- 참고문헌 수록
- 원문정보
- url
- 모체레코드
- 모체정보확인
- Control Number
- kjul:60230123
MARC
008190726s2005 ulk aa eng■022 ▼a12297607
■1001 ▼aHae Young Yoo
■24510▼aA Study on the Optimized Copper Electrochemical Plating in Dual Damascene Process▼dHae Young Yoo▼e공저 Eui Goo Chang , Nam Hoon Kim
■260 ▼a서울▼b한국전기전자재료학회▼c2005.
■300 ▼app. 225-228
■500 ▼a참고문헌 수록
■7001 ▼aEui Goo Chang , Nam Hoon Kim
■773 ▼tTransactions on Electrical and Electronic Materials▼gVol.6, No.5 (2005 October)▼d2005, 09
■856 ▼uhttp://www.kieeme.or.kr
■SIS ▼aS016400▼b60055341▼h8▼s2▼fP
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