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Diamond Conditioner Wear Characterization for a Copper CMP Process
Diamond Conditioner Wear Characterization for a Copper CMP Process
Detailed Information
- 자료유형
- 기사
- ISSN
- 12297607
- 저자명
- L. Boruckia
- 서명/저자
- Diamond Conditioner Wear Characterization for a Copper CMP Process / L. Boruckia , 공저 Y. Zhuang , R. Kikuma , N. Rikita , T. Yamashita , K. Nagasawa , H. Lee , T. Sun , D. Rosales Yeomans , A. Philipossian , T. Stout
- 발행사항
- 서울 : 한국전기전자재료학회, 2008.
- 형태사항
- pp. 15-20
- 주기사항
- 참고문헌 수록
- 원문정보
- url
- 모체레코드
- 모체정보확인
- Control Number
- kjul:60230059
MARC
008190725s2008 ulk aa eng■022 ▼a12297607
■1001 ▼aL. Boruckia
■24510▼aDiamond Conditioner Wear Characterization for a Copper CMP Process▼dL. Boruckia ▼e공저 Y. Zhuang , R. Kikuma , N. Rikita , T. Yamashita , K. Nagasawa , H. Lee , T. Sun , D. Rosales Yeomans , A. Philipossian , T. Stout
■260 ▼a서울▼b한국전기전자재료학회▼c2008.
■300 ▼app. 15-20
■500 ▼a참고문헌 수록
■7001 ▼aY. Zhuang , R. Kikuma , N. Rikita , T. Yamashita , K. Nagasawa , H. Lee , T. Sun , D. Rosales Yeomans , A. Philipossian , T. Stout
■773 ▼tTransactions on Electrical and Electronic Materials▼gVol.8, No.1 (2007 February)▼d2008, 02
■856 ▼uhttp://www.kieeme.or.kr
■SIS ▼aS037648▼b60055341▼h8▼s2▼fP
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