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Aspects of hard Breakdown Characteristics in a 2. 2-nm-thick SiO2 film
Aspects of hard Breakdown Characteristics in a 2. 2-nm-thick SiO2 film
Detailed Information
- 자료유형
- 기사
- ISSN
- 15981657
- 저자명
- Kenji Komiya
- 서명/저자
- Aspects of hard Breakdown Characteristics in a 2. 2-nm-thick SiO2 film / Kenji Komiya , 공저 Yasuhisa Omura
- 발행사항
- 서울 : 대한전자공학회, 2002.
- 형태사항
- pp. 164-169
- 주기사항
- 참고문헌 수록
- 기타저자
- Yasuhisa Omura
- 기본자료저록
- Journal of Semiconductor Technology and Science : Volume 2, Number 4, (2002 December) 2002, 12
- 원문정보
- url
- 모체레코드
- 모체정보확인
- Control Number
- kjul:60202539
MARC
008190108s2002 ulk aa eng■022 ▼a15981657
■1001 ▼aKenji Komiya
■24510▼aAspects of hard Breakdown Characteristics in a 2. 2-nm-thick SiO2 film▼dKenji Komiya▼e공저 Yasuhisa Omura
■260 ▼a서울▼b대한전자공학회▼c2002.
■300 ▼app. 164-169
■500 ▼a참고문헌 수록
■7001 ▼aYasuhisa Omura
■773 ▼tJournal of Semiconductor Technology and Science▼gVolume 2, Number 4, (2002 December)▼d2002, 12
■856 ▼ahttp://www.jsts.org
■SIS ▼aS013696▼b60054120▼h8▼s2▼fP
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