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Novel Robust Structure and High k Dielectric Material for 90 nm DRAM Capacitor
Novel Robust Structure and High k Dielectric Material for 90 nm DRAM Capacitor
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008190108s2003 ulk aa eng■022 ▼a15981657
■1001 ▼aY.K. Park
■24510▼aNovel Robust Structure and High k Dielectric Material for 90 nm DRAM Capacitor▼dY.K. Park▼e공저 Y.S.Ahn, K.H.Lee, C.H.Cho, T.Y. Chung, Kinam Kim
■260 ▼a서울▼b대한전자공학회▼c2003.
■300 ▼app. 76-82
■500 ▼a참고문헌 수록
■7001 ▼aY.S.Ahn, K.H.Lee, C.H.Cho, T.Y. Chung, Kinam Kim
■773 ▼tJournal of Semiconductor Technology and Science▼gVolume 3, Number 2, (2003 June)▼d2003, 06
■856 ▼ahttp://www.jsts.org
■SIS ▼aS013698▼b60054120▼h8▼s2▼fP
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