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Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(Co)₂ Precursor
Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(Co)₂ Precursor
Detailed Information
- 자료유형
- 기사
- ISSN
- 03744884
- 저자명
- Keunwoo Lee
- 서명/저자
- Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(Co)₂ Precursor / Keunwoo Lee , Keunjun Kim , Hyeongtag jeon , Youngjin Lee , Jeongtae Kim , Seungjin Yeom
- 발행사항
- 서울 : 한국물리학회, 2007.
- 형태사항
- pp. 1141-1146
- 기타저자
- Keunjun Kim
- 기타저자
- Hyeongtag jeon
- 기타저자
- Youngjin Lee
- 기타저자
- Jeongtae Kim
- 기타저자
- Seungjin Yeom
- 모체레코드
- 모체정보확인
- Control Number
- kjul:60147737
MARC
008101209s2007 ulka a eng■022 ▼a03744884
■1001 ▼aKeunwoo Lee
■24510▼aCharacteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(Co)₂ Precursor▼dKeunwoo Lee▼eKeunjun Kim▼eHyeongtag jeon▼eYoungjin Lee▼eJeongtae Kim▼eSeungjin Yeom
■260 ▼a서울▼b한국물리학회▼c2007.
■300 ▼app. 1141-1146
■7001 ▼aKeunjun Kim
■7001 ▼aHyeongtag jeon
■7001 ▼aYoungjin Lee
■7001 ▼aJeongtae Kim
■7001 ▼aSeungjin Yeom
■773 ▼tJournal of The Korean Physical Society▼gVol. 50 No. 4 (2007. 4)▼d2007, 04
■SIS ▼aS039453▼b60077342▼h8▼s2▼fP
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