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Chemical and Nanomechanical Characteristics of fluorocarbon Thin Films Deposited by Using Plasma Enhanced Chemical Vapor Deposition
Chemical and Nanomechanical Characteristics of fluorocarbon Thin Films Deposited by Using Plasma Enhanced Chemical Vapor Deposition
Detailed Information
- 자료유형
- 기사
- ISSN
- 03744884
- 저자명
- Nam-Kyun Kim
- 서명/저자
- Chemical and Nanomechanical Characteristics of fluorocarbon Thin Films Deposited by Using Plasma Enhanced Chemical Vapor Deposition / Nam-Kyun Kim , Nam-Goo Cha , Kyu-Chae Kim , Tae-Gon Kim , Jin-Goo Park
- 발행사항
- 서울 : 한국물리학회, 2007.
- 형태사항
- pp. 1113-1118
- 기타저자
- Nam-Goo Cha
- 기타저자
- Kyu-Chae Kim
- 기타저자
- Tae-Gon Kim
- 기타저자
- Jin-Goo Park
- 모체레코드
- 모체정보확인
- Control Number
- kjul:60147721
MARC
008101209s2007 ulka a eng■022 ▼a03744884
■1001 ▼aNam-Kyun Kim
■24510▼aChemical and Nanomechanical Characteristics of fluorocarbon Thin Films Deposited by Using Plasma Enhanced Chemical Vapor Deposition▼dNam-Kyun Kim▼eNam-Goo Cha▼eKyu-Chae Kim▼eTae-Gon Kim▼eJin-Goo Park
■260 ▼a서울▼b한국물리학회▼c2007.
■300 ▼app. 1113-1118
■7001 ▼aNam-Goo Cha
■7001 ▼aKyu-Chae Kim
■7001 ▼aTae-Gon Kim
■7001 ▼aJin-Goo Park
■773 ▼tJournal of The Korean Physical Society▼gVol. 50 No. 4 (2007. 4)▼d2007, 04
■SIS ▼aS039453▼b60077342▼h8▼s2▼fP
