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Chemical and Nanomechanical Characteristics of fluorocarbon Thin Films Deposited by Using Plasma Enhanced Chemical Vapor Deposition
Chemical and Nanomechanical Characteristics of fluorocarbon Thin Films Deposited by Using Plasma Enhanced Chemical Vapor Deposition
Detailed Information
- Material Type
- 기사
- ISSN
- 03744884
- Author
- Nam-Kyun Kim
- Title/Author
- Chemical and Nanomechanical Characteristics of fluorocarbon Thin Films Deposited by Using Plasma Enhanced Chemical Vapor Deposition / Nam-Kyun Kim ; Nam-Goo Cha ; Kyu-Chae Kim ; Tae-Gon Kim ; Jin-Goo Park
- Publish Info
- 서울 : 한국물리학회, 2007.
- Material Info
- pp. 1113-1118
- Added Entry-Personal Name
- Nam-Goo Cha
- Added Entry-Personal Name
- Kyu-Chae Kim
- Added Entry-Personal Name
- Tae-Gon Kim
- Added Entry-Personal Name
- Jin-Goo Park
- 모체레코드
- 모체정보확인
- Control Number
- kjul:60147721
MARC
008101209s2007 ulka a eng■022 ▼a03744884
■1001 ▼aNam-Kyun Kim
■24510▼aChemical and Nanomechanical Characteristics of fluorocarbon Thin Films Deposited by Using Plasma Enhanced Chemical Vapor Deposition▼dNam-Kyun Kim▼eNam-Goo Cha▼eKyu-Chae Kim▼eTae-Gon Kim▼eJin-Goo Park
■260 ▼a서울▼b한국물리학회▼c2007.
■300 ▼app. 1113-1118
■7001 ▼aNam-Goo Cha
■7001 ▼aKyu-Chae Kim
■7001 ▼aTae-Gon Kim
■7001 ▼aJin-Goo Park
■773 ▼tJournal of The Korean Physical Society▼gVol. 50 No. 4 (2007. 4)▼d2007, 04
■SIS ▼aS039453▼b60077342▼h8▼s2▼fP
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