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Study of the Characteristics of HfO₂/Hf Films Prepared by Atomic Layer Deposition on Silicon
Study of the Characteristics of HfO₂/Hf Films Prepared by Atomic Layer Deposition on Silicon
Detailed Information
- 자료유형
- 기사
- ISSN
- 03744884
- 저자명
- Seung-Woo Do
- 서명/저자
- Study of the Characteristics of HfO₂/Hf Films Prepared by Atomic Layer Deposition on Silicon / Seung-Woo Do , Yong-Hyun Lee , Jae-Sung Lee
- 발행사항
- 서울 : 한국물리학회, 2007.
- 형태사항
- pp. 666-669
- 기타저자
- Yong-Hyun Lee
- 기타저자
- Jae-Sung Lee
- 모체레코드
- 모체정보확인
- Control Number
- kjul:60147301
MARC
008101201s2007 ulka a eng■022 ▼a03744884
■1001 ▼aSeung-Woo Do
■24510▼aStudy of the Characteristics of HfO₂/Hf Films Prepared by Atomic Layer Deposition on Silicon▼dSeung-Woo Do▼eYong-Hyun Lee▼eJae-Sung Lee
■260 ▼a서울▼b한국물리학회▼c2007.
■300 ▼app. 666-669
■7001 ▼aYong-Hyun Lee
■7001 ▼aJae-Sung Lee
■773 ▼tJournal of The Korean Physical Society▼gVol. 50 No. 3 (2007. 3)▼d2007, 03
■SIS ▼aS037722▼b60077342▼h8▼s2▼fP
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