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Remaining Oxide and Low-Energy Ion Implantation of BF₂+ for Si(100)
Remaining Oxide and Low-Energy Ion Implantation of BF₂+ for Si(100)
Detailed Information
- 자료유형
- 기사
- ISSN
- 03744884
- 저자명
- Woo-Jung Lee
- 서명/저자
- Remaining Oxide and Low-Energy Ion Implantation of BF₂+ for Si(100) / Woo-Jung Lee , Youn-Seoung Lee , Kwang-Su Cheong , Sa-Kyun Rha , Ki-Man Kim , Won-Jun Lee
- 발행사항
- 서울 : 한국물리학회, 2007.
- 형태사항
- pp. 657-661
- 기타저자
- Youn-Seoung Lee
- 기타저자
- Kwang-Su Cheong
- 기타저자
- Sa-Kyun Rha
- 기타저자
- Ki-Man Kim
- 기타저자
- Won-Jun Lee
- 모체레코드
- 모체정보확인
- Control Number
- kjul:60147299
MARC
008101201s2007 ulka a eng■022 ▼a03744884
■1001 ▼aWoo-Jung Lee
■24510▼aRemaining Oxide and Low-Energy Ion Implantation of BF₂+ for Si(100)▼dWoo-Jung Lee▼eYoun-Seoung Lee▼eKwang-Su Cheong▼eSa-Kyun Rha▼eKi-Man Kim▼eWon-Jun Lee
■260 ▼a서울▼b한국물리학회▼c2007.
■300 ▼app. 657-661
■7001 ▼aYoun-Seoung Lee
■7001 ▼aKwang-Su Cheong
■7001 ▼aSa-Kyun Rha
■7001 ▼aKi-Man Kim
■7001 ▼aWon-Jun Lee
■773 ▼tJournal of The Korean Physical Society▼gVol. 50 No. 3 (2007. 3)▼d2007, 03
■SIS ▼aS037722▼b60077342▼h8▼s2▼fP
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