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Preparation of HfO₂ Thin Films by Using Photoassisted MOCVD and Their Characterization by Using Photoreflectance Spectroscopy
Preparation of HfO₂ Thin Films by Using Photoassisted MOCVD and Their Characterization by Using Photoreflectance Spectroscopy
Detailed Information
- 자료유형
- 기사
- ISSN
- 03744884
- 서명/저자
- Preparation of HfO₂ Thin Films by Using Photoassisted MOCVD and Their Characterization by Using Photoreflectance Spectroscopy / Takeshi Kanashima , Hyun Lee , Masanori Okuyama
- 발행사항
- 서울 : 한국물리학회, 2007.
- 형태사항
- pp. 772-775
- 기타저자
- Hyun Lee
- 기타저자
- Masanori Okuyama
- 모체레코드
- 모체정보확인
- Control Number
- kjul:60146888
MARC
008101123s2007 ulka a eng■022 ▼a03744884
■1001 ▼aTakeshi Kanashima
■24510▼aPreparation of HfO₂ Thin Films by Using Photoassisted MOCVD and Their Characterization by Using Photoreflectance Spectroscopy▼dTakeshi Kanashima▼eHyun Lee▼eMasanori Okuyama
■260 ▼a서울▼b한국물리학회▼c2007.
■300 ▼app. 772-775
■7001 ▼aHyun Lee
■7001 ▼aMasanori Okuyama
■773 ▼tJournal of The Korean Physical Society▼gVol. 51 No. 2 Pt.1(2007. 8)▼d2007, 08
■SIS ▼aS041153▼b60077342▼h8▼s2▼fP
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