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Growth Temperature Dependence of TiO₂ Thin films prepared by Using Plasma-Enhanced Atomic layer Deposition Method
Growth Temperature Dependence of TiO₂ Thin films prepared by Using Plasma-Enhanced Atomic layer Deposition Method
Detailed Information
- 자료유형
- 기사
- ISSN
- 03744884
- 저자명
- G. X. Liu
- 서명/저자
- Growth Temperature Dependence of TiO₂ Thin films prepared by Using Plasma-Enhanced Atomic layer Deposition Method / G. X. Liu , F. K. Shan , W. J. Lee , B. C. Shin
- 발행사항
- 서울 : 한국물리학회, 2007.
- 형태사항
- pp. 1827-1832
- 기타저자
- F. K. Shan
- 기타저자
- W. J. Lee
- 기타저자
- B. C. Shin
- 모체레코드
- 모체정보확인
- Control Number
- kjul:60146100
MARC
008101028s2007 ulka a eng■022 ▼a03744884
■1001 ▼aG. X. Liu
■24510▼aGrowth Temperature Dependence of TiO₂ Thin films prepared by Using Plasma-Enhanced Atomic layer Deposition Method▼dG. X. Liu▼eF. K. Shan▼eW. J. Lee▼eB. C. Shin
■260 ▼a서울▼b한국물리학회▼c2007.
■300 ▼app. 1827-1832
■7001 ▼aF. K. Shan
■7001 ▼aW. J. Lee
■7001 ▼aB. C. Shin
■773 ▼tJournal of The Korean Physical Society▼gVol. 50 No. 6 (2007. 6)▼d2007, 06
■SIS ▼aS040681▼b60077342▼h8▼s2▼fP
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