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Comparative Study on the Structural and Electrical Properties of Low-k SiOC(-H) Films Deposited by Using Plasma Enhanced Chemical Bapor Deposition
Comparative Study on the Structural and Electrical Properties of Low-k SiOC(-H) Films Deposited by Using Plasma Enhanced Chemical Bapor Deposition
Detailed Information
- 자료유형
- 기사
- ISSN
- 03744884
- 서명/저자
- Comparative Study on the Structural and Electrical Properties of Low-k SiOC(-H) Films Deposited by Using Plasma Enhanced Chemical Bapor Deposition / Anvar Sagatovich Zakirov , Rangaswamy Navamathavan , Yong Jun Jang , An Soo Jung , Kwang-Man Lee , Chi Kyu Choi
- 발행사항
- 서울 : 한국물리학회, 2007.
- 형태사항
- pp. 1809-1813
- 기타저자
- Yong Jun Jang
- 기타저자
- An Soo Jung
- 기타저자
- Kwang-Man Lee
- 기타저자
- Chi Kyu Choi
- 모체레코드
- 모체정보확인
- Control Number
- kjul:60146095
MARC
008101028s2007 ulka a eng■022 ▼a03744884
■1001 ▼aAnvar Sagatovich Zakirov
■24510▼aComparative Study on the Structural and Electrical Properties of Low-k SiOC(-H) Films Deposited by Using Plasma Enhanced Chemical Bapor Deposition▼dAnvar Sagatovich Zakirov▼eRangaswamy Navamathavan▼eYong Jun Jang▼eAn Soo Jung▼eKwang-Man Lee▼eChi Kyu Choi
■260 ▼a서울▼b한국물리학회▼c2007.
■300 ▼app. 1809-1813
■7001 ▼aRangaswamy Navamathavan
■7001 ▼aYong Jun Jang
■7001 ▼aAn Soo Jung
■7001 ▼aKwang-Man Lee
■7001 ▼aChi Kyu Choi
■773 ▼tJournal of The Korean Physical Society▼gVol. 50 No. 6 (2007. 6)▼d2007, 06
■SIS ▼aS040681▼b60077342▼h8▼s2▼fP
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