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Metal Precursor Effects on Deposition and Interfacial Characteristics of HfO₂ Dielectrics Grown by Atomic Layer Deposition
Metal Precursor Effects on Deposition and Interfacial Characteristics of HfO₂ Dielectrics Grown by Atomic Layer Deposition
Detailed Information
- 자료유형
- 기사
- ISSN
- 03744884
- 저자명
- In-Sung Park
- 서명/저자
- Metal Precursor Effects on Deposition and Interfacial Characteristics of HfO₂ Dielectrics Grown by Atomic Layer Deposition / In-Sung Park , Taeho Lee , Duck-Kyun Choi , Jinho Ahn
- 발행사항
- 서울 : 한국물리학회, 2007.
- 형태사항
- pp. 544-547
- 기타저자
- Taeho Lee
- 기타저자
- Duck-Kyun Choi
- 기타저자
- Jinho Ahn
- 모체레코드
- 모체정보확인
- Control Number
- kjul:60145871
MARC
008101027s2007 ulka a eng■022 ▼a03744884
■1001 ▼aIn-Sung Park
■24510▼aMetal Precursor Effects on Deposition and Interfacial Characteristics of HfO₂ Dielectrics Grown by Atomic Layer Deposition ▼dIn-Sung Park▼eTaeho Lee▼eDuck-Kyun Choi▼eJinho Ahn
■260 ▼a서울▼b한국물리학회▼c2007.
■300 ▼app. 544-547
■7001 ▼aTaeho Lee
■7001 ▼aDuck-Kyun Choi
■7001 ▼aJinho Ahn
■773 ▼tJournal of The Korean Physical Society▼gVol. 49 supplementary isssu II.(2006.12)▼d2007, 01
■SIS ▼aS036913▼b60077342▼h8▼s2▼fP
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