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Use of Neural Network to Characterize Temperature Effects on Deposition Rate of PECVD-silicon Nitride Thin Films
Use of Neural Network to Characterize Temperature Effects on Deposition Rate of PECVD-silicon Nitride Thin Films
Detailed Information
- 자료유형
- 기사
- ISSN
- 03744884
- 저자명
- Byungwhan Kim
- 서명/저자
- Use of Neural Network to Characterize Temperature Effects on Deposition Rate of PECVD-silicon Nitride Thin Films / Byungwhan Kim , Jae Young Park , Sang Jeen Hong , Seung Soo Han
- 발행사항
- 서울 : 한국물리학회, 2006.
- 형태사항
- pp. S364-S368
- 기타저자
- Jae Young Park
- 기타저자
- Sang Jeen Hong
- 기타저자
- Seung Soo Han
- 모체레코드
- 모체정보확인
- Control Number
- kjul:60145785
MARC
008101025s2006 ulka a eng■022 ▼a03744884
■1001 ▼aByungwhan Kim
■24510▼aUse of Neural Network to Characterize Temperature Effects on Deposition Rate of PECVD-silicon Nitride Thin Films▼dByungwhan Kim ▼eJae Young Park▼eSang Jeen Hong▼eSeung Soo Han
■260 ▼a서울▼b한국물리학회▼c2006.
■300 ▼app. S364-S368
■7001 ▼aJae Young Park
■7001 ▼aSang Jeen Hong
■7001 ▼aSeung Soo Han
■773 ▼tJournal of The Korean Physical Society▼gVol. 49 supplementary isssu I.(2006.12)▼d2006, 12
■SIS ▼aS036911▼b60077342▼h8▼s2▼fP
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