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Novel Ashing Process of Heavily Implanted Photoresist
Novel Ashing Process of Heavily Implanted Photoresist
Detailed Information
- 자료유형
- 기사
- ISSN
- 03744884
- 저자명
- Se-Geun Park
- 서명/저자
- Novel Ashing Process of Heavily Implanted Photoresist / Se-Geun Park , Seung-Kook Yang , Jaekyun Yang
- 발행사항
- 서울 : 한국물리학회, 2007.
- 형태사항
- pp. S732-S735
- 기타저자
- Seung-Kook Yang
- 기타저자
- Jaekyun Yang
- 모체레코드
- 모체정보확인
- Control Number
- kjul:60145318
MARC
008101015s2007 ulka a eng■022 ▼a03744884
■1001 ▼aSe-Geun Park
■24510▼aNovel Ashing Process of Heavily Implanted Photoresist▼dSe-Geun Park▼eSeung-Kook Yang▼eJaekyun Yang
■260 ▼a서울▼b한국물리학회▼c2007.
■300 ▼app. S732-S735
■7001 ▼aSeung-Kook Yang
■7001 ▼aJaekyun Yang
■773 ▼tJournal of The Korean Physical Society▼gVol. 49 supplementary isssu III.(2006.12)▼d2007, 01
■SIS ▼aS036912▼b60077342▼h8▼s2▼fP
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