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Study on the Characteristics of SiO₂ Films Prepared by Hydrogen-Assisted Low-Pressure Radical Oxidation Using Batch-Type Equipment with a 100-Wafers of 300-mm-Diameter Capability
Study on the Characteristics of SiO₂ Films Prepared by Hydrogen-Assisted Low-Pressure Radical Oxidation Using Batch-Type Equipment with a 100-Wafers of 300-mm-Diameter Capability
Detailed Information
- 자료유형
- 기사
- ISSN
- 03744884
- 저자명
- Jae-Jong Han
- 서명/저자
- Study on the Characteristics of SiO₂ Films Prepared by Hydrogen-Assisted Low-Pressure Radical Oxidation Using Batch-Type Equipment with a 100-Wafers of 300-mm-Diameter Capability / Jae-Jong Han , Kong-Soo Lee , Jung-Geun Jee , Woong Lee , Yong-Woo Hyung , Hyeon-Deok Lee , Jin-Ho Ahn
- 발행사항
- 서울 : 한국물리학회, 2006.
- 형태사항
- pp. 2028-2033
- 기타저자
- Kong-Soo Lee
- 기타저자
- Jung-Geun Jee
- 기타저자
- Woong Lee
- 기타저자
- Yong-Woo Hyung
- 기타저자
- Hyeon-Deok Lee
- 기타저자
- Jin-Ho Ahn
- 모체레코드
- 모체정보확인
- Control Number
- kjul:60145210
MARC
008101014s2006 ulka a eng■022 ▼a03744884
■1001 ▼aJae-Jong Han
■24510▼aStudy on the Characteristics of SiO₂ Films Prepared by Hydrogen-Assisted Low-Pressure Radical Oxidation Using Batch-Type Equipment with a 100-Wafers of 300-mm-Diameter Capability▼dJae-Jong Han▼eKong-Soo Lee▼eJung-Geun Jee▼eWoong Lee▼eYong-Woo Hyung▼eHyeon-Deok Lee▼eJin-Ho Ahn
■260 ▼a서울▼b한국물리학회▼c2006.
■300 ▼app. 2028-2033
■7001 ▼aKong-Soo Lee
■7001 ▼aJung-Geun Jee
■7001 ▼aWoong Lee
■7001 ▼aYong-Woo Hyung
■7001 ▼aHyeon-Deok Lee
■7001 ▼aJin-Ho Ahn
■773 ▼tJournal of The Korean Physical Society▼gVol. 49 No. 5 (2006. 11)▼d2006, 11
■SIS ▼aS036672▼b60077342▼h8▼s2▼fP
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