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Characteristics of the Post-Etch Polymer Residues Formed at the Via Hole and Polymer Removal Using a Semi-Aqueous Stripper
Characteristics of the Post-Etch Polymer Residues Formed at the Via Hole and Polymer Removal Using a Semi-Aqueous Stripper
Detailed Information
- Material Type
- 기사
- ISSN
- 03744884
- Author
- Sung Bea Kim
- Title/Author
- Characteristics of the Post-Etch Polymer Residues Formed at the Via Hole and Polymer Removal Using a Semi-Aqueous Stripper / Sung Bea Kim ; Hyeongtag Jeon
- Publish Info
- 서울 : 한국물리학회, 2006.
- Material Info
- pp. 1991-1997
- Added Entry-Personal Name
- Hyeongtag Jeon
- 모체레코드
- 모체정보확인
- Control Number
- kjul:60145153
MARC
008101014s2006 ulka a eng■022 ▼a03744884
■1001 ▼aSung Bea Kim
■24510▼aCharacteristics of the Post-Etch Polymer Residues Formed at the Via Hole and Polymer Removal Using a Semi-Aqueous Stripper▼dSung Bea Kim▼eHyeongtag Jeon
■260 ▼a서울▼b한국물리학회▼c2006.
■300 ▼app. 1991-1997
■7001 ▼aHyeongtag Jeon
■773 ▼tJournal of The Korean Physical Society▼gVol. 49 No. 5 (2006. 11)▼d2006, 11
■SIS ▼aS036672▼b60077342▼h8▼s2▼fP
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