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Effect of Process Parameters of UV-Assisted Gas-Phase Cleaning on the Removal of PEG (Polyethyleneglycol) from a Si Substrate
Effect of Process Parameters of UV-Assisted Gas-Phase Cleaning on the Removal of PEG (Polyethyleneglycol) from a Si Substrate
Detailed Information
- 자료유형
- 기사
- ISSN
- 03744884
- 저자명
- Sung Ku Kwon
- 서명/저자
- Effect of Process Parameters of UV-Assisted Gas-Phase Cleaning on the Removal of PEG (Polyethyleneglycol) from a Si Substrate / Sung Ku Kwon , Do Hyun Kim
- 발행사항
- 서울 : 한국물리학회, 2006.
- 형태사항
- pp. 1421-1427
- 기타저자
- Do Hyun Kim
- 모체레코드
- 모체정보확인
- Control Number
- kjul:60144788
MARC
008101011s2006 ulka a eng■022 ▼a03744884
■1001 ▼aSung Ku Kwon
■24510▼aEffect of Process Parameters of UV-Assisted Gas-Phase Cleaning on the Removal of PEG (Polyethyleneglycol) from a Si Substrate▼dSung Ku Kwon▼eDo Hyun Kim
■260 ▼a서울▼b한국물리학회▼c2006.
■300 ▼app. 1421-1427
■7001 ▼aDo Hyun Kim
■773 ▼tJournal of The Korean Physical Society▼gVol. 49 No. 4 (2006. 10)▼d2006, 10
■SIS ▼aS035357▼b60077342▼h8▼s2▼fP
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