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Atomic Layer Deposition of La₂O₃Thin films by Using an Electron Cyclotron Resonance Plasma Source
Atomic Layer Deposition of La₂O₃Thin films by Using an Electron Cyclotron Resonance Plasma Source
Detailed Information
- Material Type
- 기사
- ISSN
- 03744884
- Author
- Beom-Yong Kim
- Title/Author
- Atomic Layer Deposition of La₂O₃Thin films by Using an Electron Cyclotron Resonance Plasma Source / Beom-Yong Kim ; Myoung-gyun Ko ; Eun-Joo Lee ; Min-S00 Hong ; You-Jin Jeon ; Jong-Wan Park
- Publish Info
- 서울 : 한국물리학회, 2006.
- Material Info
- pp. 1303-1306
- Added Entry-Personal Name
- Myoung-gyun Ko
- Added Entry-Personal Name
- Eun-Joo Lee
- Added Entry-Personal Name
- Min-S00 Hong
- Added Entry-Personal Name
- You-Jin Jeon
- Added Entry-Personal Name
- Jong-Wan Park
- 모체레코드
- 모체정보확인
- Control Number
- kjul:60144251
MARC
008101007s2006 ulka a eng■022 ▼a03744884
■1001 ▼aBeom-Yong Kim
■24510▼aAtomic Layer Deposition of La₂O₃Thin films by Using an Electron Cyclotron Resonance Plasma Source▼dBeom-Yong Kim▼eMyoung-gyun Ko▼eEun-Joo Lee▼eMin-S00 Hong▼eYou-Jin Jeon▼eJong-Wan Park
■260 ▼a서울▼b한국물리학회▼c2006.
■300 ▼app. 1303-1306
■7001 ▼aMyoung-gyun Ko
■7001 ▼aEun-Joo Lee
■7001 ▼aMin-S00 Hong
■7001 ▼aYou-Jin Jeon
■7001 ▼aJong-Wan Park
■773 ▼tJournal of The Korean Physical Society▼gVol. 49 No. 3 (2006. 9)▼d2006, 09
■SIS ▼aS034322▼b60077342▼h8▼s2▼fP
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