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Property ImProvement of Aluminum-Oxide Thin Films Deposited under Photon Radiation by Using Atomic Layer Deposition
Property ImProvement of Aluminum-Oxide Thin Films Deposited under Photon Radiation by Using Atomic Layer Deposition
Detailed Information
- Material Type
- 기사
- ISSN
- 03744884
- Author
- Hyeong Joon Kim
- Title/Author
- Property ImProvement of Aluminum-Oxide Thin Films Deposited under Photon Radiation by Using Atomic Layer Deposition / Hyeong Joon Kim ; Sang Yong No ; Dail Eom ; Cheol Seong Hwang
- Publish Info
- 서울 : 한국물리학회, 2006.
- Material Info
- pp. 1271-1275
- Added Entry-Personal Name
- Sang Yong No
- Added Entry-Personal Name
- Dail Eom
- Added Entry-Personal Name
- Cheol Seong Hwang
- 모체레코드
- 모체정보확인
- Control Number
- kjul:60144245
MARC
008101007s2006 ulka a eng■022 ▼a03744884
■1001 ▼aHyeong Joon Kim
■24510▼aProperty ImProvement of Aluminum-Oxide Thin Films Deposited under Photon Radiation by Using Atomic Layer Deposition▼dHyeong Joon Kim▼eSang Yong No▼eDail Eom▼eCheol Seong Hwang
■260 ▼a서울▼b한국물리학회▼c2006.
■300 ▼app. 1271-1275
■7001 ▼aSang Yong No
■7001 ▼aDail Eom
■7001 ▼aCheol Seong Hwang
■773 ▼tJournal of The Korean Physical Society▼gVol. 49 No. 3 (2006. 9)▼d2006, 09
■SIS ▼aS034322▼b60077342▼h8▼s2▼fP
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