서브메뉴
검색
Atomistic Simulation for a Nano-CMOS Process : From Ion Implantation to Diffusion
Atomistic Simulation for a Nano-CMOS Process : From Ion Implantation to Diffusion
상세정보
- 자료유형
- 기사
- ISSN
- 03744884
- 저자명
- Jae-Hyun Yoo
- 서명/저자
- Atomistic Simulation for a Nano-CMOS Process : From Ion Implantation to Diffusion / Jae-Hyun Yoo , Kwan-Sun Yoon , Joong-Sik Kim , Taeyoung Won
- 발행사항
- 서울 : 한국물리학회, 2006.
- 형태사항
- pp. 1260-1265
- 기타저자
- Kwan-Sun Yoon
- 기타저자
- Joong-Sik Kim
- 기타저자
- Taeyoung Won
- 모체레코드
- 모체정보확인
- Control Number
- kjul:60144243
MARC
008101007s2006 ulka a eng■022 ▼a03744884
■1001 ▼aJae-Hyun Yoo
■24510▼aAtomistic Simulation for a Nano-CMOS Process▼bFrom Ion Implantation to Diffusion▼dJae-Hyun Yoo▼eKwan-Sun Yoon▼eJoong-Sik Kim▼eTaeyoung Won
■260 ▼a서울▼b한국물리학회▼c2006.
■300 ▼app. 1260-1265
■7001 ▼aKwan-Sun Yoon
■7001 ▼aJoong-Sik Kim
■7001 ▼aTaeyoung Won
■773 ▼tJournal of The Korean Physical Society▼gVol. 49 No. 3 (2006. 9)▼d2006, 09
■SIS ▼aS034322▼b60077342▼h8▼s2▼fP
