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SiO₂Films Deposited at Low TemPerature by Using APCVD with TEOS/O₃for TFT Applications
SiO₂Films Deposited at Low TemPerature by Using APCVD with TEOS/O₃for TFT Applications
Detailed Information
- 자료유형
- 기사
- ISSN
- 03744884
- 저자명
- Junsik Kim
- 서명/저자
- SiO₂Films Deposited at Low TemPerature by Using APCVD with TEOS/O₃for TFT Applications / Junsik Kim , Sunghyun Hwang , Junsin Yi
- 발행사항
- 서울 : 한국물리학회, 2006.
- 형태사항
- pp. 1121-1125
- 기타저자
- Sunghyun Hwang
- 기타저자
- Junsin Yi
- 모체레코드
- 모체정보확인
- Control Number
- kjul:60144152
MARC
008101006s2006 ulka a eng■022 ▼a03744884
■1001 ▼aJunsik Kim
■24510▼aSiO₂Films Deposited at Low TemPerature by Using APCVD with TEOS/O₃for TFT Applications▼dJunsik Kim▼eSunghyun Hwang▼eJunsin Yi
■260 ▼a서울▼b한국물리학회▼c2006.
■300 ▼app. 1121-1125
■7001 ▼aSunghyun Hwang
■7001 ▼aJunsin Yi
■773 ▼tJournal of The Korean Physical Society▼gVol. 49 No. 3 (2006. 9)▼d2006, 09
■SIS ▼aS034322▼b60077342▼h8▼s2▼fP
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