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Effect of the Hydroxy1-Ethy1-Cellulose Concentration in a silicon Wafer Polishing Slurry on the Wafer Surface Roughness
Effect of the Hydroxy1-Ethy1-Cellulose Concentration in a silicon Wafer Polishing Slurry on the Wafer Surface Roughness
Detailed Information
- 자료유형
- 기사
- ISSN
- 03744884
- 저자명
- Kyu-Chul Cho
- 서명/저자
- Effect of the Hydroxy1-Ethy1-Cellulose Concentration in a silicon Wafer Polishing Slurry on the Wafer Surface Roughness / Kyu-Chul Cho , Hyeongtag Jeon , Jea-Gun Park
- 발행사항
- 서울 : 한국물리학회, 2006.
- 형태사항
- pp. 507-509
- 기타저자
- Hyeongtag Jeon
- 기타저자
- Jea-Gun Park
- 모체레코드
- 모체정보확인
- Control Number
- kjul:60143937
MARC
008100927s2006 ulka a eng■022 ▼a03744884
■1001 ▼aKyu-Chul Cho
■24510▼aEffect of the Hydroxy1-Ethy1-Cellulose Concentration in a silicon Wafer Polishing Slurry on the Wafer Surface Roughness▼dKyu-Chul Cho▼eHyeongtag Jeon▼eJea-Gun Park
■260 ▼a서울▼b한국물리학회▼c2006.
■300 ▼app. 507-509
■7001 ▼aHyeongtag Jeon
■7001 ▼aJea-Gun Park
■773 ▼tJournal of The Korean Physical Society▼gVol. 48 No. 4 (2006. 4)▼d2006, 04
■SIS ▼aS028401▼b60077342▼h8▼s2▼fP
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