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Mask Error Enhancement Factor Variation With Pattern Density for 65 nm and 90 nm Line Widths
Mask Error Enhancement Factor Variation With Pattern Density for 65 nm and 90 nm Line Widths
Detailed Information
- 자료유형
- 기사
- ISSN
- 03744884
- 저자명
- Hye-Young Kang
- 서명/저자
- Mask Error Enhancement Factor Variation With Pattern Density for 65 nm and 90 nm Line Widths / Hye-Young Kang , Chang-Ho Lee , Sung-Hyuck Kim , Hye-Keun Oh
- 발행사항
- 서울 : 한국물리학회, 2006.
- 형태사항
- pp. 246-249
- 기타저자
- Chang-Ho Lee
- 기타저자
- Sung-Hyuck Kim
- 기타저자
- Hye-Keun Oh
- 모체레코드
- 모체정보확인
- Control Number
- kjul:60143876
MARC
008100927s2006 ulka a eng■022 ▼a03744884
■1001 ▼aHye-Young Kang
■24510▼aMask Error Enhancement Factor Variation With Pattern Density for 65 nm and 90 nm Line Widths▼dHye-Young Kang▼eChang-Ho Lee▼eSung-Hyuck Kim▼eHye-Keun Oh
■260 ▼a서울▼b한국물리학회▼c2006.
■300 ▼app. 246-249
■7001 ▼aChang-Ho Lee
■7001 ▼aSung-Hyuck Kim
■7001 ▼aHye-Keun Oh
■773 ▼tJournal of The Korean Physical Society▼gVol. 48 No. 2 (2006. 2)▼d2006, 02
■SIS ▼aS028399▼b60077342▼h8▼s2▼fP
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