서브메뉴
검색
Mask Error Enhancement Factor Variation With Pattern Density for 65 nm and 90 nm Line Widths
Mask Error Enhancement Factor Variation With Pattern Density for 65 nm and 90 nm Line Widths
Detailed Information
- Material Type
- 기사
- ISSN
- 03744884
- Author
- Hye-Young Kang
- Title/Author
- Mask Error Enhancement Factor Variation With Pattern Density for 65 nm and 90 nm Line Widths / Hye-Young Kang ; Chang-Ho Lee ; Sung-Hyuck Kim ; Hye-Keun Oh
- Publish Info
- 서울 : 한국물리학회, 2006.
- Material Info
- pp. 246-249
- Added Entry-Personal Name
- Chang-Ho Lee
- Added Entry-Personal Name
- Sung-Hyuck Kim
- Added Entry-Personal Name
- Hye-Keun Oh
- 모체레코드
- 모체정보확인
- Control Number
- kjul:60143876
MARC
008100927s2006 ulka a eng■022 ▼a03744884
■1001 ▼aHye-Young Kang
■24510▼aMask Error Enhancement Factor Variation With Pattern Density for 65 nm and 90 nm Line Widths▼dHye-Young Kang▼eChang-Ho Lee▼eSung-Hyuck Kim▼eHye-Keun Oh
■260 ▼a서울▼b한국물리학회▼c2006.
■300 ▼app. 246-249
■7001 ▼aChang-Ho Lee
■7001 ▼aSung-Hyuck Kim
■7001 ▼aHye-Keun Oh
■773 ▼tJournal of The Korean Physical Society▼gVol. 48 No. 2 (2006. 2)▼d2006, 02
■SIS ▼aS028399▼b60077342▼h8▼s2▼fP
Preview
Export
ChatGPT Discussion
AI Recommended Related Books
Detail Info.
- Reservation
- Not Exist
- My Folder
- Reference Materials for Thesis Writing
- Reference Materials for Research Ethics
- Job-Related Books
