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Characteristics of SiOxNy Films Deposited by PECVD at Low-Temperatyre Using BTBAS-NH3-O2
Characteristics of SiOxNy Films Deposited by PECVD at Low-Temperatyre Using BTBAS-NH3-O2
Detailed Information
- Material Type
- 기사
- ISSN
- 03744884
- Author
- June Hee Lee
- Title/Author
- Characteristics of SiOxNy Films Deposited by PECVD at Low-Temperatyre Using BTBAS-NH3-O2 / June Hee Lee ; Chang Hyun Jeong ; Jong Tae Lim ; V. A.Zavaleyev ; Kyung Suk Min ; Se jin Kyung ; Geun Young Yeom
- Publish Info
- 서울 : 한국물리학회, 2006.
- Material Info
- pp. 89-92
- Added Entry-Personal Name
- Chang Hyun Jeong
- Added Entry-Personal Name
- Jong Tae Lim
- Added Entry-Personal Name
- V. A.Zavaleyev
- Added Entry-Personal Name
- Kyung Suk Min
- Added Entry-Personal Name
- Se jin Kyung
- Added Entry-Personal Name
- Geun Young Yeom
- 모체레코드
- 모체정보확인
- Control Number
- kjul:60143595
MARC
008100916s2006 ulka a eng■022 ▼a03744884
■1001 ▼aJune Hee Lee
■24510▼aCharacteristics of SiOxNy Films Deposited by PECVD at Low-Temperatyre Using BTBAS-NH3-O2▼dJune Hee Lee▼eChang Hyun Jeong▼eJong Tae Lim▼eV. A.Zavaleyev▼eKyung Suk Min▼eSe jin Kyung ▼eGeun Young Yeom
■260 ▼a서울▼b한국물리학회▼c2006.
■300 ▼app. 89-92
■7001 ▼aChang Hyun Jeong
■7001 ▼aJong Tae Lim
■7001 ▼aV. A.Zavaleyev
■7001 ▼aKyung Suk Min
■7001 ▼aSe jin Kyung
■7001 ▼aGeun Young Yeom
■773 ▼tJournal of The Korean Physical Society▼gVol. 48 No. 1 (2006. 1)▼d2006, 01
■SIS ▼aS028398▼b60077342▼h8▼s2▼fP
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