서브메뉴
검색
Characteristics of SiOxNy Films Deposited by PECVD at Low-Temperatyre Using BTBAS-NH3-O2
Characteristics of SiOxNy Films Deposited by PECVD at Low-Temperatyre Using BTBAS-NH3-O2
상세정보
- 자료유형
- 기사
- ISSN
- 03744884
- 저자명
- June Hee Lee
- 서명/저자
- Characteristics of SiOxNy Films Deposited by PECVD at Low-Temperatyre Using BTBAS-NH3-O2 / June Hee Lee , Chang Hyun Jeong , Jong Tae Lim , V. A.Zavaleyev , Kyung Suk Min , Se jin Kyung , Geun Young Yeom
- 발행사항
- 서울 : 한국물리학회, 2006.
- 형태사항
- pp. 89-92
- 기타저자
- Chang Hyun Jeong
- 기타저자
- Jong Tae Lim
- 기타저자
- V. A.Zavaleyev
- 기타저자
- Kyung Suk Min
- 기타저자
- Se jin Kyung
- 기타저자
- Geun Young Yeom
- 모체레코드
- 모체정보확인
- Control Number
- kjul:60143595
MARC
008100916s2006 ulka a eng■022 ▼a03744884
■1001 ▼aJune Hee Lee
■24510▼aCharacteristics of SiOxNy Films Deposited by PECVD at Low-Temperatyre Using BTBAS-NH3-O2▼dJune Hee Lee▼eChang Hyun Jeong▼eJong Tae Lim▼eV. A.Zavaleyev▼eKyung Suk Min▼eSe jin Kyung ▼eGeun Young Yeom
■260 ▼a서울▼b한국물리학회▼c2006.
■300 ▼app. 89-92
■7001 ▼aChang Hyun Jeong
■7001 ▼aJong Tae Lim
■7001 ▼aV. A.Zavaleyev
■7001 ▼aKyung Suk Min
■7001 ▼aSe jin Kyung
■7001 ▼aGeun Young Yeom
■773 ▼tJournal of The Korean Physical Society▼gVol. 48 No. 1 (2006. 1)▼d2006, 01
■SIS ▼aS028398▼b60077342▼h8▼s2▼fP
