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Mechanistic Details of Atomic Layer Deposition (ALD) Processes
Mechanistic Details of Atomic Layer Deposition (ALD) Processes
Detailed Information
- Material Type
- 기사
- ISSN
- 03744884
- Author
- Mingde Xu
- Title/Author
- Mechanistic Details of Atomic Layer Deposition (ALD) Processes / Mingde Xu ; Hugo Tiznado ; Byung-Chang Kang ; Menno Bouman ; Ilkeun Lee ; Francisco Zaera
- Publish Info
- 서울 : 한국물리학회, 2007.
- Material Info
- pp. 1063-1068
- Added Entry-Personal Name
- Hugo Tiznado
- Added Entry-Personal Name
- Byung-Chang Kang
- Added Entry-Personal Name
- Menno Bouman
- Added Entry-Personal Name
- Ilkeun Lee
- Added Entry-Personal Name
- Francisco Zaera
- 모체레코드
- 모체정보확인
- Control Number
- kjul:60141644
MARC
008100819s2007 ulka a eng■022 ▼a03744884
■1001 ▼aMingde Xu
■24510▼aMechanistic Details of Atomic Layer Deposition (ALD) Processes▼dMingde Xu▼eHugo Tiznado▼eByung-Chang Kang▼eMenno Bouman▼eIlkeun Lee▼eFrancisco Zaera
■260 ▼a서울▼b한국물리학회▼c2007.
■300 ▼app. 1063-1068
■7001 ▼aHugo Tiznado
■7001 ▼aByung-Chang Kang
■7001 ▼aMenno Bouman
■7001 ▼aIlkeun Lee
■7001 ▼aFrancisco Zaera
■773 ▼tJournal of The Korean Physical Society▼gVol. 51 No. 3 (2007. 9)▼d2007, 09
■SIS ▼aS043255▼b60077342▼h8▼s2▼fP
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