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Mechanistic Details of Atomic Layer Deposition (ALD) Processes
Mechanistic Details of Atomic Layer Deposition (ALD) Processes
Detailed Information
- 자료유형
- 기사
- ISSN
- 03744884
- 저자명
- Mingde Xu
- 서명/저자
- Mechanistic Details of Atomic Layer Deposition (ALD) Processes / Mingde Xu , Hugo Tiznado , Byung-Chang Kang , Menno Bouman , Ilkeun Lee , Francisco Zaera
- 발행사항
- 서울 : 한국물리학회, 2007.
- 형태사항
- pp. 1063-1068
- 기타저자
- Hugo Tiznado
- 기타저자
- Byung-Chang Kang
- 기타저자
- Menno Bouman
- 기타저자
- Ilkeun Lee
- 기타저자
- Francisco Zaera
- 모체레코드
- 모체정보확인
- Control Number
- kjul:60141644
MARC
008100819s2007 ulka a eng■022 ▼a03744884
■1001 ▼aMingde Xu
■24510▼aMechanistic Details of Atomic Layer Deposition (ALD) Processes▼dMingde Xu▼eHugo Tiznado▼eByung-Chang Kang▼eMenno Bouman▼eIlkeun Lee▼eFrancisco Zaera
■260 ▼a서울▼b한국물리학회▼c2007.
■300 ▼app. 1063-1068
■7001 ▼aHugo Tiznado
■7001 ▼aByung-Chang Kang
■7001 ▼aMenno Bouman
■7001 ▼aIlkeun Lee
■7001 ▼aFrancisco Zaera
■773 ▼tJournal of The Korean Physical Society▼gVol. 51 No. 3 (2007. 9)▼d2007, 09
■SIS ▼aS043255▼b60077342▼h8▼s2▼fP
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