서브메뉴
검색
Chemical States and Band-Gap Energy for Plasma-Nitrided Ultrathin Si Oxynitride Film
Chemical States and Band-Gap Energy for Plasma-Nitrided Ultrathin Si Oxynitride Film
Detailed Information
- Material Type
- 기사
- ISSN
- 03744884
- Author
- Hua Jin
- Title/Author
- Chemical States and Band-Gap Energy for Plasma-Nitrided Ultrathin Si Oxynitride Film / Hua Jin ; Suhk Kun Oh ; Hee Jae Kang ; Jae Cheol lee
- Publish Info
- 서울 : 한국물리학회, 2007.
- Material Info
- pp. 1042-1045
- Added Entry-Personal Name
- Suhk Kun Oh
- Added Entry-Personal Name
- Hee Jae Kang
- Added Entry-Personal Name
- Jae Cheol lee
- 모체레코드
- 모체정보확인
- Control Number
- kjul:60141625
MARC
008100819s2007 ulka a eng■022 ▼a03744884
■1001 ▼aHua Jin
■24510▼aChemical States and Band-Gap Energy for Plasma-Nitrided Ultrathin Si Oxynitride Film▼dHua Jin ▼eSuhk Kun Oh▼eHee Jae Kang▼eJae Cheol lee
■260 ▼a서울▼b한국물리학회▼c2007.
■300 ▼app. 1042-1045
■7001 ▼aSuhk Kun Oh
■7001 ▼aHee Jae Kang
■7001 ▼aJae Cheol lee
■773 ▼tJournal of The Korean Physical Society▼gVol. 51 No. 3 (2007. 9)▼d2007, 09
■SIS ▼aS043255▼b60077342▼h8▼s2▼fP
Preview
Export
ChatGPT Discussion
AI Recommended Related Books
Detail Info.
- Reservation
- Not Exist
- My Folder
- Reference Materials for Thesis Writing
- Reference Materials for Research Ethics
- Job-Related Books
