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Chemical States and Band-Gap Energy for Plasma-Nitrided Ultrathin Si Oxynitride Film
Chemical States and Band-Gap Energy for Plasma-Nitrided Ultrathin Si Oxynitride Film
Detailed Information
- 자료유형
- 기사
- ISSN
- 03744884
- 저자명
- Hua Jin
- 서명/저자
- Chemical States and Band-Gap Energy for Plasma-Nitrided Ultrathin Si Oxynitride Film / Hua Jin , Suhk Kun Oh , Hee Jae Kang , Jae Cheol lee
- 발행사항
- 서울 : 한국물리학회, 2007.
- 형태사항
- pp. 1042-1045
- 기타저자
- Suhk Kun Oh
- 기타저자
- Hee Jae Kang
- 기타저자
- Jae Cheol lee
- 모체레코드
- 모체정보확인
- Control Number
- kjul:60141625
MARC
008100819s2007 ulka a eng■022 ▼a03744884
■1001 ▼aHua Jin
■24510▼aChemical States and Band-Gap Energy for Plasma-Nitrided Ultrathin Si Oxynitride Film▼dHua Jin ▼eSuhk Kun Oh▼eHee Jae Kang▼eJae Cheol lee
■260 ▼a서울▼b한국물리학회▼c2007.
■300 ▼app. 1042-1045
■7001 ▼aSuhk Kun Oh
■7001 ▼aHee Jae Kang
■7001 ▼aJae Cheol lee
■773 ▼tJournal of The Korean Physical Society▼gVol. 51 No. 3 (2007. 9)▼d2007, 09
■SIS ▼aS043255▼b60077342▼h8▼s2▼fP
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