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Plasma Kinetic Study of Silicon-Dioxide Removal with Fluorocompounds in a Plasma-Enhanced Chemical Vapor Deposition Chamber
Plasma Kinetic Study of Silicon-Dioxide Removal with Fluorocompounds in a Plasma-Enhanced Chemical Vapor Deposition Chamber
상세정보
- 자료유형
- 기사
- ISSN
- 03744884
- 저자명
- Heeyeop Chae
- 서명/저자
- Plasma Kinetic Study of Silicon-Dioxide Removal with Fluorocompounds in a Plasma-Enhanced Chemical Vapor Deposition Chamber / Heeyeop Chae , Hebert H. Sawin
- 발행사항
- 서울 : 한국물리학회, 2007.
- 형태사항
- pp. 978-983
- 기타저자
- Hebert H. Sawin
- 모체레코드
- 모체정보확인
- Control Number
- kjul:60141576
MARC
008100819s2007 ulka a eng■022 ▼a03744884
■1001 ▼aHeeyeop Chae
■24510▼aPlasma Kinetic Study of Silicon-Dioxide Removal with Fluorocompounds in a Plasma-Enhanced Chemical Vapor Deposition Chamber▼dHeeyeop Chae▼eHebert H. Sawin
■260 ▼a서울▼b한국물리학회▼c2007.
■300 ▼app. 978-983
■7001 ▼aHebert H. Sawin
■773 ▼tJournal of The Korean Physical Society▼gVol. 51 No. 3 (2007. 9)▼d2007, 09
■SIS ▼aS043255▼b60077342▼h8▼s2▼fP
