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Influence of Substrate Temperature and O₂Flow on the Properties of RF-Magnetron-Sputttered Indium-Tin-Oxide Thin Films
Influence of Substrate Temperature and O₂Flow on the Properties of RF-Magnetron-Sputttered Indium-Tin-Oxide Thin Films
Detailed Information
- 자료유형
- 기사
- ISSN
- 03744884
- 저자명
- T. S. Kim
- 서명/저자
- Influence of Substrate Temperature and O₂Flow on the Properties of RF-Magnetron-Sputttered Indium-Tin-Oxide Thin Films / T. S. Kim , C. H. Choi , T. S. Jeong , K. H. Shim
- 발행사항
- 서울 : 한국물리학회, 2007.
- 형태사항
- pp. 534-538
- 기타저자
- C. H. Choi
- 기타저자
- T. S. Jeong
- 기타저자
- K. H. Shim
- 모체레코드
- 모체정보확인
- Control Number
- kjul:60141210
MARC
008100816s2007 ulka a eng■022 ▼a03744884
■1001 ▼aT. S. Kim
■24510▼aInfluence of Substrate Temperature and O₂Flow on the Properties of RF-Magnetron-Sputttered Indium-Tin-Oxide Thin Films▼dT. S. Kim▼eC. H. Choi▼eT. S. Jeong▼eK. H. Shim
■260 ▼a서울▼b한국물리학회▼c2007.
■300 ▼app. 534-538
■7001 ▼aC. H. Choi
■7001 ▼aT. S. Jeong
■7001 ▼aK. H. Shim
■773 ▼tJournal of The Korean Physical Society▼gVol. 51 No. 2 (2007. 8)▼d2007, 08
■SIS ▼aS041152▼b60077342▼h8▼s2▼fP
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