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Generation of 193-nm Femtosecond Light Pulses and Their Application to Photomask Repair
Generation of 193-nm Femtosecond Light Pulses and Their Application to Photomask Repair
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MARC
008100816s2007 ulka a eng■022 ▼a03744884
■1001 ▼aD. Lim
■24510▼aGeneration of 193-nm Femtosecond Light Pulses and Their Application to Photomask Repair▼dD. Lim▼eR. Haight
■260 ▼a서울▼b한국물리학회▼c2007.
■300 ▼app. 498-502
■7001 ▼aR. Haight
■773 ▼tJournal of The Korean Physical Society▼gVol. 51 No. 2 (2007. 8)▼d2007, 08
■SIS ▼aS041152▼b60077342▼h8▼s2▼fP
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