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Precise Analysis of H, C, N, and O as Dominant Impurities in Cu Films: Complementary Use of SIMS and GDMS
Precise Analysis of H, C, N, and O as Dominant Impurities in Cu Films: Complementary Use of SIMS and GDMS
Detailed Information
- 자료유형
- 기사
- ISSN
- 15989623
- 저자명
- Jae-Won Lim
- 서명/저자
- Precise Analysis of H, C, N, and O as Dominant Impurities in Cu Films: Complementary Use of SIMS and GDMS / Jae-Won Lim , Minoru Isshiki
- 발행사항
- 서울 : 대한금속재료학회, 2005.
- 형태사항
- pp. 273-278
- 기타저자
- Minoru Isshiki
- 모체레코드
- 모체정보확인
- Control Number
- kjul:60132436
MARC
008100610s2005 ulka a eng■022 ▼a15989623
■1001 ▼aJae-Won Lim
■24510▼aPrecise Analysis of H, C, N, and O as Dominant Impurities in Cu Films: Complementary Use of SIMS and GDMS▼dJae-Won Lim▼eMinoru Isshiki
■260 ▼a서울▼b대한금속재료학회▼c2005.
■300 ▼app. 273-278
■7001 ▼aMinoru Isshiki
■773 ▼tMetals and Materials international▼gVOL.11 NO.4 (2005 AUGUST)▼d2005, 08
■SIS ▼aS025139▼b60013551▼h8▼s2▼fP
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