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Property of Cobalt Nickel Silicide by Thermal Annealing of Co/Ni Bilayer on a Silicon Substrate
Property of Cobalt Nickel Silicide by Thermal Annealing of Co/Ni Bilayer on a Silicon Subs...
Property of Cobalt Nickel Silicide by Thermal Annealing of Co/Ni Bilayer on a Silicon Substrate

Detailed Information

Material Type  
 기사
ISSN  
15989623
Author  
Seonghwee Cheong
Title/Author  
Property of Cobalt Nickel Silicide by Thermal Annealing of Co/Ni Bilayer on a Silicon Substrate / 저 Seonghwee Cheong ; 공저 Ohsung Song, Min-Sung Kim
Publish Info  
서울 : 대한금속재료학회, 2006.
Material Info  
pp. 189-192
Added Entry-Personal Name  
Ohsung Song, Min-Sung Kim
Host Item Entry  
Metals and Materials international : VOL.12 NO.2 (2006 APRIL) 2006, 04
모체레코드  
모체정보확인
Control Number  
kjul:60132330

MARC

 008100608s2006        ulka    a                          eng
■022    ▼a15989623
■1001  ▼aSeonghwee  Cheong
■24510▼aProperty  of  Cobalt  Nickel  Silicide  by  Thermal  Annealing  of  Co/Ni  Bilayer  on  a  Silicon  Substrate▼d저  Seonghwee  Cheong▼e공저  Ohsung  Song,  Min-Sung  Kim
■260    ▼a서울▼b대한금속재료학회▼c2006.
■300    ▼app.  189-192
■7001  ▼aOhsung  Song,  Min-Sung  Kim
■773    ▼tMetals  and  Materials  international▼gVOL.12  NO.2  (2006  APRIL)▼d2006,  04
■SIS    ▼aS025143▼b60013551▼h8▼s2▼fP

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