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Property of Cobalt Nickel Silicide by Thermal Annealing of Co/Ni Bilayer on a Silicon Substrate
Property of Cobalt Nickel Silicide by Thermal Annealing of Co/Ni Bilayer on a Silicon Substrate
Detailed Information
- 자료유형
- 기사
- ISSN
- 15989623
- 저자명
- Seonghwee Cheong
- 서명/저자
- Property of Cobalt Nickel Silicide by Thermal Annealing of Co/Ni Bilayer on a Silicon Substrate / 저 Seonghwee Cheong , 공저 Ohsung Song, Min-Sung Kim
- 발행사항
- 서울 : 대한금속재료학회, 2006.
- 형태사항
- pp. 189-192
- 모체레코드
- 모체정보확인
- Control Number
- kjul:60132330
MARC
008100608s2006 ulka a eng■022 ▼a15989623
■1001 ▼aSeonghwee Cheong
■24510▼aProperty of Cobalt Nickel Silicide by Thermal Annealing of Co/Ni Bilayer on a Silicon Substrate▼d저 Seonghwee Cheong▼e공저 Ohsung Song, Min-Sung Kim
■260 ▼a서울▼b대한금속재료학회▼c2006.
■300 ▼app. 189-192
■7001 ▼aOhsung Song, Min-Sung Kim
■773 ▼tMetals and Materials international▼gVOL.12 NO.2 (2006 APRIL)▼d2006, 04
■SIS ▼aS025143▼b60013551▼h8▼s2▼fP
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