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Systematic Investigation of Metal Gates on Atomic-Layer-Deposited HfO₂
Systematic Investigation of Metal Gates on Atomic-Layer-Deposited HfO₂
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MARC
008100607s2005 ulka a eng■022 ▼a17388090
■1001 ▼aHyundoek Yang and Hyunsang Hwang
■24510▼aSystematic Investigation of Metal Gates on Atomic-Layer-Deposited HfO₂▼dHyundoek Yang and Hyunsang Hwang
■260 ▼a서울▼b대한금속재료학회▼c2005.
■300 ▼app. 31-40
■773 ▼tELECTRONIC MATERIALS Letters▼gVol. 1 No. 1▼d2005, 11
■SIS ▼aS027262▼b60077032▼h8▼s2▼fP
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