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Plasma Enhanced Atomic Layer Deposition of TaN Thin Films Using TaF5 and N₂/H₂/Ar Plasma
Plasma Enhanced Atomic Layer Deposition of TaN Thin Films Using TaF5 and N₂/H₂/Ar Plasma
Detailed Information
- 자료유형
- 기사
- ISSN
- 17388090
- 저자명
- Hoi-Sung Chung
- 서명/저자
- Plasma Enhanced Atomic Layer Deposition of TaN Thin Films Using TaF5 and N₂/H₂/Ar Plasma / Hoi-Sung Chung , Jung-Dae Kwon , nd Sang-Won Kang
- 발행사항
- 서울 : 대한금속재료학회, 2005.
- 형태사항
- pp. 149-154
- 기타저자
- Jung-Dae Kwon
- 기타저자
- nd Sang-Won Kang
- 모체레코드
- 모체정보확인
- Control Number
- kjul:60132173
MARC
008100607s2005 ulka a eng■022 ▼a17388090
■1001 ▼aHoi-Sung Chung
■24510▼aPlasma Enhanced Atomic Layer Deposition of TaN Thin Films Using TaF5 and N₂/H₂/Ar Plasma▼dHoi-Sung Chung▼eJung-Dae Kwon▼end Sang-Won Kang
■260 ▼a서울▼b대한금속재료학회▼c2005.
■300 ▼app. 149-154
■7001 ▼aJung-Dae Kwon
■7001 ▼and Sang-Won Kang
■773 ▼tELECTRONIC MATERIALS Letters▼gVol. 1 No. 2▼d2005, 12
■SIS ▼aS028678▼b60077032▼h8▼s2▼fP
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