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Structure of SiO₂Films Grown at Low Temperature by Inductively Coupled Plasma Oxidation with Oxygen Gas
Structure of SiO₂Films Grown at Low Temperature by Inductively Coupled Plasma Oxidation with Oxygen Gas
Detailed Information
- Material Type
- 기사
- ISSN
- 17388090
- Author
- Yong Woo Choi
- Title/Author
- Structure of SiO₂Films Grown at Low Temperature by Inductively Coupled Plasma Oxidation with Oxygen Gas / Yong Woo Choi ; Jin Hung Ahn ; nd Byung Tae Ahn
- Publish Info
- 서울 : 대한금속재료학회, 2005.
- Material Info
- pp. 97-102
- Added Entry-Personal Name
- Jin Hung Ahn
- Added Entry-Personal Name
- nd Byung Tae Ahn
- Host Item Entry
- ELECTRONIC MATERIALS Letters : Vol. 1 No. 2 2005, 12
- 모체레코드
- 모체정보확인
- Control Number
- kjul:60132164
MARC
008100607s2005 ulka a eng■022 ▼a17388090
■1001 ▼aYong Woo Choi
■24510▼aStructure of SiO₂Films Grown at Low Temperature by Inductively Coupled Plasma Oxidation with Oxygen Gas▼dYong Woo Choi▼eJin Hung Ahn▼end Byung Tae Ahn
■260 ▼a서울▼b대한금속재료학회▼c2005.
■300 ▼app. 97-102
■7001 ▼aJin Hung Ahn
■7001 ▼and Byung Tae Ahn
■773 ▼tELECTRONIC MATERIALS Letters▼gVol. 1 No. 2▼d2005, 12
■SIS ▼aS028678▼b60077032▼h8▼s2▼fP
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