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EPS(Elementwise Pattemed Stamp) 를 이용한 UV 나노임프린트 공정에서 웨이퍼 변형에 따른 잔류층 분석
EPS(Elementwise Pattemed Stamp) 를 이용한 UV 나노임프린트 공정에서 웨이퍼 변형에 따른 잔류층 분석
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MARC
008100331s2005 ulka a kor■022 ▼a12264873
■100 ▼a김기돈
■245 ▼aEPS(Elementwise Pattemed Stamp) 를 이용한 UV 나노임프린트 공정에서 웨이퍼 변형에 따른 잔류층 분석▼d김기돈▼e심영석▼e정준호▼e손현기▼e이응숙▼e이상찬▼e방영매 공저
■260 ▼a서울▼b대한기계학회▼c2005.
■300 ▼app. 1169-1174
■7001 ▼a심영석
■7001 ▼a정준호
■7001 ▼a손현기
■7001 ▼a이응숙
■7001 ▼a이상찬
■7001 ▼a방영매
■773 ▼t대한기계학회논문집A=Transactions of the korean society of mechanical .▼g제29권 제9호 (통권 제240호)(2005년 9월)▼d2005, 09
■SIS ▼aS016280▼b60013871▼h8▼s2▼fP
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