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A 10-Gb/s Planar InGaAs/InP Avalanche Photodiode with a Thin Multiplication Layer Fabricated by Using Recess-Etching and Single-Diffusion Processes
A 10-Gb/s Planar InGaAs/InP Avalanche Photodiode with a Thin Multiplication Layer Fabricat...
A 10-Gb/s Planar InGaAs/InP Avalanche Photodiode with a Thin Multiplication Layer Fabricated by Using Recess-Etching and Single-Diffusion Processes

Detailed Information

Material Type  
 기사
ISSN  
03744884
Author  
Sungmin Hwang.
Title/Author  
A 10-Gb/s Planar InGaAs/InP Avalanche Photodiode with a Thin Multiplication Layer Fabricated by Using Recess-Etching and Single-Diffusion Processes / Sungmin Hwang. ; Jongin Shim ; Kyungyul Yoo.
Publish Info  
서울 : 한국물리학회, 2006.
Material Info  
pp. 253-260
Index Term-Uncontrolled  
10GBS PLANAR INGAASINP AVALANCHE PHOTODIODE MULTIPLICATION LAYER FABRICATED USING RECESSETCHING SINGLEDIFFUSION PROCESSES
Added Entry-Personal Name  
Jongin Shim
Added Entry-Personal Name  
Kyungyul Yoo.
Host Item Entry  
Journal of The Korean Physical Society : Vol. 49 No. 1 (2006. 7) 2006, 07
URL  
http://www.kps.or.kr
모체레코드  
모체정보확인
Control Number  
kjul:60097470

MARC

 008070417s2006        ULKa    a                          ENG
■022    ▼a03744884
■1001  ▼aSungmin  Hwang.
■245    ▼aA  10-Gb/s  Planar  InGaAs/InP  Avalanche  Photodiode  with  a  Thin  Multiplication  Layer  Fabricated  by  Using  Recess-Etching  and  Single-Diffusion  Processes                  ▼dSungmin  Hwang.      ▼eJongin  Shim▼eKyungyul  Yoo.
■260    ▼a서울▼b한국물리학회▼c2006.
■300    ▼app.  253-260
■653    ▼a10GBS▼aPLANAR▼aINGAASINP▼aAVALANCHE▼aPHOTODIODE▼aMULTIPLICATION▼aLAYER▼aFABRICATED▼aUSING▼aRECESSETCHING▼aSINGLEDIFFUSION▼aPROCESSES
■7001  ▼aJongin  Shim
■7001  ▼aKyungyul  Yoo.
■773    ▼tJournal  of  The  Korean  Physical  Society▼gVol.  49  No.  1  (2006.  7)▼d2006,  07
■URL    ▼ahttp://www.kps.or.kr
■SIS    ▼aS028404▼b60077342▼h8▼s2

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