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Simulation of Rectangular Isolated Pattern Images by Applying Phase Shift Masks in High-Exposure Gaps to Protect LCD Photo Masks
Simulation of Rectangular Isolated Pattern Images by Applying Phase Shift Masks in High-Exposure Gaps to Protect LCD Photo Masks
Detailed Information
- Material Type
- 기사
- ISSN
- 03744884
- Author
- Jung-hyuk Cho.
- Title/Author
- Simulation of Rectangular Isolated Pattern Images by Applying Phase Shift Masks in High-Exposure Gaps to Protect LCD Photo Masks / Jung-hyuk Cho. ; Jung-min Sohn ; Sung-hyuck Kim ; Jong-sun Kim ; Jin-back Park ; Sung-jin Kim ; Hye-keun Oh.
- Publish Info
- 서울 : 한국물리학회, 2006.
- Material Info
- pp. 115-120
- Index Term-Uncontrolled
- SIMULATION RECTANGULAR ISOLATED PATTERN IMAGES APPLYING PHASE SHIFT MASKS HIGHEXPOSURE GAPS PROTECT LCD PHOTO
- Added Entry-Personal Name
- Jung-min Sohn
- Added Entry-Personal Name
- Sung-hyuck Kim
- Added Entry-Personal Name
- Jong-sun Kim
- Added Entry-Personal Name
- Jin-back Park
- Added Entry-Personal Name
- Sung-jin Kim
- Added Entry-Personal Name
- Hye-keun Oh.
- 모체레코드
- 모체정보확인
- Control Number
- kjul:60097445
MARC
008070417s2006 ULKa a ENG■022 ▼a03744884
■1001 ▼aJung-hyuk Cho.
■245 ▼aSimulation of Rectangular Isolated Pattern Images by Applying Phase Shift Masks in High-Exposure Gaps to Protect LCD Photo Masks ▼dJung-hyuk Cho.▼eJung-min Sohn▼eSung-hyuck Kim▼eJong-sun Kim▼eJin-back Park▼eSung-jin Kim▼eHye-keun Oh.
■260 ▼a서울▼b한국물리학회▼c2006.
■300 ▼app. 115-120
■653 ▼aSIMULATION▼aRECTANGULAR▼aISOLATED▼aPATTERN▼aIMAGES▼aAPPLYING▼aPHASE▼aSHIFT▼aMASKS▼aHIGHEXPOSURE▼aGAPS▼aPROTECT▼aLCD▼aPHOTO
■7001 ▼aJung-min Sohn
■7001 ▼aSung-hyuck Kim
■7001 ▼aJong-sun Kim
■7001 ▼aJin-back Park
■7001 ▼aSung-jin Kim
■7001 ▼aHye-keun Oh.
■773 ▼tJournal of The Korean Physical Society▼gVol. 49 No. 1 (2006. 7)▼d2006, 07
■URL ▼ahttp://www.kps.or.kr
■SIS ▼aS028404▼b60077342▼h8▼s2
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