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A study on the Plasma Parameters and Characteristics of Carbon-Doped Silicon-Oxide Films by Using MTMS/O₂ and He Plasmas
A study on the Plasma Parameters and Characteristics of Carbon-Doped Silicon-Oxide Films by Using MTMS/O₂ and He Plasmas
Detailed Information
- 자료유형
- 기사
- ISSN
- 03744884
- 저자명
- Min Sung Kang.
- 서명/저자
- A study on the Plasma Parameters and Characteristics of Carbon-Doped Silicon-Oxide Films by Using MTMS/O₂ and He Plasmas / Min Sung Kang , Chang Sil Yang , Chi Kyu Choi , Won Bong Jung.
- 발행사항
- 서울 : 한국물리학회, 2006.
- 형태사항
- pp. 1702-1707
- 기타저자
- Chang Sil Yang
- 기타저자
- Chi Kyu Choi
- 기타저자
- Won Bong Jung.
- 모체레코드
- 모체정보확인
- Control Number
- kjul:60097219
MARC
008070413s2006 ULKa a ENG■022 ▼a03744884
■1001 ▼aMin Sung Kang.
■245 ▼aA study on the Plasma Parameters and Characteristics of Carbon-Doped Silicon-Oxide Films by Using MTMS/O₂ and He Plasmas ▼dMin Sung Kang▼eChang Sil Yang▼eChi Kyu Choi▼eWon Bong Jung.
■260 ▼a서울▼b한국물리학회▼c2006.
■300 ▼app. 1702-1707
■653 ▼aSTUDY▼aPLASMA▼aPARAMETERS▼aCHARACTERISTICS▼aCARBONDOPED▼aSILICONOXIDE▼aFILMS▼aUSING▼aMTMSO₂▼aPLASMAS
■7001 ▼aChang Sil Yang
■7001 ▼aChi Kyu Choi
■7001 ▼aWon Bong Jung.
■773 ▼tJournal of The Korean Physical Society▼gVol. 48 No. 6 (2006. 6)▼d2006, 06
■URL ▼ahttp://www.kps.or.kr
■SIS ▼aS028403▼b60077342▼h8▼s2
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