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Application of a High-Durability DC arc Plasmatron to Plasma-Chemical Processing of Silicon Substrates
Application of a High-Durability DC arc Plasmatron to Plasma-Chemical Processing of Silicon Substrates
Detailed Information
- 자료유형
- 기사
- ISSN
- 03744884
- 서명/저자
- Application of a High-Durability DC arc Plasmatron to Plasma-Chemical Processing of Silicon Substrates / Valentin A. Riaby. , Vadim Yu. Plaksin , Ji Hun Kim , Young Sun Mok , Heon-ju Lee , Chi Kyu Choi.
- 발행사항
- 서울 : 한국물리학회, 2006.
- 형태사항
- pp. 1696-1701
- 기타저자
- Vadim Yu. Plaksin
- 기타저자
- Ji Hun Kim
- 기타저자
- Young Sun Mok
- 기타저자
- Heon-ju Lee
- 기타저자
- Chi Kyu Choi.
- 모체레코드
- 모체정보확인
- Control Number
- kjul:60097218
MARC
008070413s2006 ULKa a ENG■022 ▼a03744884
■1001 ▼aValentin A. Riaby.
■245 ▼aApplication of a High-Durability DC arc Plasmatron to Plasma-Chemical Processing of Silicon Substrates ▼dValentin A. Riaby. ▼eVadim Yu. Plaksin▼eJi Hun Kim▼eYoung Sun Mok▼eHeon-ju Lee▼eChi Kyu Choi.
■260 ▼a서울▼b한국물리학회▼c2006.
■300 ▼app. 1696-1701
■653 ▼aAPPLICATION▼aHIGHDURABILITY▼aDC▼aPLASMATRON▼aPLASMACHEMICAL▼aPROCESSING▼aSILICON▼aSUBSTRATES
■7001 ▼aVadim Yu. Plaksin
■7001 ▼aJi Hun Kim
■7001 ▼aYoung Sun Mok
■7001 ▼aHeon-ju Lee
■7001 ▼aChi Kyu Choi.
■773 ▼tJournal of The Korean Physical Society▼gVol. 48 No. 6 (2006. 6)▼d2006, 06
■URL ▼ahttp://www.kps.or.kr
■SIS ▼aS028403▼b60077342▼h8▼s2
