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Studies of Low-Dielectric-Constant SiOC(-H) Thin Films Deposited by Using MTES/O₂-PECVD
Studies of Low-Dielectric-Constant SiOC(-H) Thin Films Deposited by Using MTES/O₂-PECVD
Detailed Information
- 자료유형
- 기사
- ISSN
- 03744884
- 서명/저자
- Studies of Low-Dielectric-Constant SiOC(-H) Thin Films Deposited by Using MTES/O₂-PECVD / Rangaswamy Navamathavan. , Chi Kyu Choi , Kwang-man Lee.
- 발행사항
- 서울 : 한국물리학회, 2006.
- 형태사항
- pp. 1675-1679
- 기타저자
- Chi Kyu Choi
- 기타저자
- Kwang-man Lee.
- 모체레코드
- 모체정보확인
- Control Number
- kjul:60097214
MARC
008070413s2006 ULKa a ENG■022 ▼a03744884
■1001 ▼aRangaswamy Navamathavan.
■245 ▼aStudies of Low-Dielectric-Constant SiOC(-H) Thin Films Deposited by Using MTES/O₂-PECVD ▼dRangaswamy Navamathavan.▼eChi Kyu Choi▼eKwang-man Lee.
■260 ▼a서울▼b한국물리학회▼c2006.
■300 ▼app. 1675-1679
■653 ▼aSTUDIES▼aLOWDIELECTRICCONSTANT▼aSIOCH▼aFILMS▼aDEPOSITED▼aUSING▼aMTESO₂PECVD
■7001 ▼aChi Kyu Choi
■7001 ▼aKwang-man Lee.
■773 ▼tJournal of The Korean Physical Society▼gVol. 48 No. 6 (2006. 6)▼d2006, 06
■URL ▼ahttp://www.kps.or.kr
■SIS ▼aS028403▼b60077342▼h8▼s2
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