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Effect of Plasma Treatment on the Performance of a Thin-Film Transistor Made of Poly-Si by Using Ni-Mediated Crystallization
Effect of Plasma Treatment on the Performance of a Thin-Film Transistor Made of Poly-Si by Using Ni-Mediated Crystallization
Detailed Information
- 자료유형
- 기사
- ISSN
- 03744884
- 저자명
- Sang Kyu Kim.
- 서명/저자
- Effect of Plasma Treatment on the Performance of a Thin-Film Transistor Made of Poly-Si by Using Ni-Mediated Crystallization / Sang Kyu Kim , Jae Hwan Oh , Jun Hyuk Cheon , Jin Jang.
- 발행사항
- 서울 : 한국물리학회, 2006.
- 형태사항
- pp. 1526-1529
- 키워드
- EFFECT PLASMA TREATMENT PERFORMANCE THINFILM TRANSISTOR MADE POLYSI USING NIMEDIATED CRYSTALLIZATION
- 기타저자
- Jae Hwan Oh
- 기타저자
- Jun Hyuk Cheon
- 기타저자
- Jin Jang.
- 모체레코드
- 모체정보확인
- Control Number
- kjul:60097151
MARC
008070412s2006 ULKa a ENG■022 ▼a03744884
■1001 ▼aSang Kyu Kim.
■245 ▼aEffect of Plasma Treatment on the Performance of a Thin-Film Transistor Made of Poly-Si by Using Ni-Mediated Crystallization ▼dSang Kyu Kim▼eJae Hwan Oh▼eJun Hyuk Cheon▼eJin Jang.
■260 ▼a서울▼b한국물리학회▼c2006.
■300 ▼app. 1526-1529
■653 ▼aEFFECT▼aPLASMA▼aTREATMENT▼aPERFORMANCE▼aTHINFILM▼aTRANSISTOR▼aMADE▼aPOLYSI▼aUSING▼aNIMEDIATED▼aCRYSTALLIZATION
■7001 ▼aJae Hwan Oh
■7001 ▼aJun Hyuk Cheon
■7001 ▼aJin Jang.
■773 ▼tJournal of The Korean Physical Society▼gVol. 48 No. 6 (2006. 6)▼d2006, 06
■URL ▼ahttp://www.kps.or.kr
■SIS ▼aS028403▼b60077342▼h8▼s2
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